Surface decomposition reactions and growth mechanisms are the key influences on the physicochemical properties of the deposited films. It is therefore essential to fully characterize and understand ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the Graduate School of Semiconductor Materials and Devices Engineering at UNIST, has made a ...

BLOOMINGTON, Minn.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT), the trusted technology realization partner, today announced it will offer customers a new semiconductor processing tool for ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

Forge Nano's breakthrough changes that equation completely by simultaneously delivering 1000:1 aspect ratio conformality, ALD-quality film uniformity and speed. This is one of the rare semiconductor ...

Atomic layer deposition (ALD) has emerged as a critical technique for fabricating ultrathin films with atomic-scale precision. In particular, ruthenium thin films are of great interest in the ...

A new technical paper titled “Large-area synthesis of high electrical performance MoS 2 by a commercially scalable atomic layer deposition process” by researchers at the University of Southampton, LMU ...

SAN JOSE, Calif.--(BUSINESS WIRE)--AVACO, specializing in the manufacture of sputtering (PVD) vacuum deposition equipment and atomic layer deposition (ALD) equipment, today announced the development ...

Atomic Layer Deposition (ALD) and thin film technologies have become indispensable in modern materials science thanks to their ability to achieve angstrom‐level control over film thickness and ...

With its newly-developed “Spatial ALD” deposition system, Laser Zentrum Hannover can now also uniformly coat complex-shaped optics. The innovative system achieves higher deposition rates than ...

We first developed a virtual device structure to test how ALD thickness affects hole size uniformity and CD. We started our virtual experiment by using two crisscross SAQP processes and transferring a ...