IEEE

Correlation Between CD/LWR and Focus Level Fitting Error: A Process Quality Indicator

Abstract: Achieving uniformity of patterns on photoresists is a significant challenge as process nodes get smaller. In practical production lines, the level sensor (LS) of the lithography system will ...
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‘What could have been a crisis now looks like a managed process’: Officials expect work on water main break to take 2 more weeks

SYRACUSE, N.Y. (WSYR-TV) — Amid a million-dollar project to fix the water main break forcing many Central New Yorkers to conserve water, officials said today that they expect the work to take at least ...
IEEE

Enhancing Real-Time Tactile Interaction Information: A Novel Approach Using Gaussian Process Regression and Differential Pulse Code Modulation

Abstract: In recent years, tactile interaction has gained prominence in applications where real-time feedback is crucial, such as robotic surgery and tactile internet applications. These applications ...
中国日报网

China pushes forward legislative process of draft ecological environment code

BEIJING -- China is making progress on the legislative process for the draft ecological environment code with the newly revised draft code submitted Monday to an ongoing session of the Standing ...